Ivashchenko, V. I., Porada, O. K., Ivashchenko, L. A., Timofeeva, I. I., Sinel’nichenko, O. K., Butenko, O. O., Ushakov, M. V., Ushakova, L. A. (2009) Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane. Powder Metallurgy and Metal Ceramics, 48. 66-72 doi:10.1007/s11106-009-9096-9
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane | ||
| Journal | Powder Metallurgy and Metal Ceramics | ||
| Authors | Ivashchenko, V. I. | Author | |
| Porada, O. K. | Author | ||
| Ivashchenko, L. A. | Author | ||
| Timofeeva, I. I. | Author | ||
| Sinel’nichenko, O. K. | Author | ||
| Butenko, O. O. | Author | ||
| Ushakov, M. V. | Author | ||
| Ushakova, L. A. | Author | ||
| Year | 2009 (January) | Volume | 48 |
| Publisher | Springer Science and Business Media LLC | ||
| DOI | doi:10.1007/s11106-009-9096-9Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8024330 | Long-form Identifier | mindat:1:5:8024330:0 |
| GUID | 0 | ||
| Full Reference | Ivashchenko, V. I., Porada, O. K., Ivashchenko, L. A., Timofeeva, I. I., Sinel’nichenko, O. K., Butenko, O. O., Ushakov, M. V., Ushakova, L. A. (2009) Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane. Powder Metallurgy and Metal Ceramics, 48. 66-72 doi:10.1007/s11106-009-9096-9 | ||
| Plain Text | Ivashchenko, V. I., Porada, O. K., Ivashchenko, L. A., Timofeeva, I. I., Sinel’nichenko, O. K., Butenko, O. O., Ushakov, M. V., Ushakova, L. A. (2009) Characteristics of thin plasmachemical silicon carbon nitride films deposited using hexamethyldisilane. Powder Metallurgy and Metal Ceramics, 48. 66-72 doi:10.1007/s11106-009-9096-9 | ||
| In | (n.d.) Powder Metallurgy and Metal Ceramics Vol. 48. Springer Science and Business Media LLC | ||
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