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Baek, Kye Hyun, Edgar, Thomas F., Song, Kiwook, Choi, Gilheyun, Cho, Han Ku, Han, Chonghun (2014) An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing. Computers & Chemical Engineering, 61. 20-29 doi:10.1016/j.compchemeng.2013.09.016

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Reference TypeJournal (article/letter/editorial)
TitleAn effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing
JournalComputers & Chemical Engineering
AuthorsBaek, Kye HyunAuthor
Edgar, Thomas F.Author
Song, KiwookAuthor
Choi, GilheyunAuthor
Cho, Han KuAuthor
Han, ChonghunAuthor
Year2014 (February)Volume61
PublisherElsevier BV
DOIdoi:10.1016/j.compchemeng.2013.09.016Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID6609503Long-form Identifiermindat:1:5:6609503:5
GUID0
Full ReferenceBaek, Kye Hyun, Edgar, Thomas F., Song, Kiwook, Choi, Gilheyun, Cho, Han Ku, Han, Chonghun (2014) An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing. Computers & Chemical Engineering, 61. 20-29 doi:10.1016/j.compchemeng.2013.09.016
Plain TextBaek, Kye Hyun, Edgar, Thomas F., Song, Kiwook, Choi, Gilheyun, Cho, Han Ku, Han, Chonghun (2014) An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing. Computers & Chemical Engineering, 61. 20-29 doi:10.1016/j.compchemeng.2013.09.016
In(n.d.) Computers & Chemical Engineering Vol. 61. Elsevier BV

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