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Tay, Arthur, Khuen Ho, Weng, Deng, Jiewen, Keng Lok, Boon (2006) Control of photoresist film thickness: Iterative feedback tuning approach. Computers & Chemical Engineering, 30. 572-579 doi:10.1016/j.compchemeng.2005.10.004

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Reference TypeJournal (article/letter/editorial)
TitleControl of photoresist film thickness: Iterative feedback tuning approach
JournalComputers & Chemical Engineering
AuthorsTay, ArthurAuthor
Khuen Ho, WengAuthor
Deng, JiewenAuthor
Keng Lok, BoonAuthor
Year2006 (January)Volume30
PublisherElsevier BV
DOIdoi:10.1016/j.compchemeng.2005.10.004Search in ResearchGate
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Mindat Ref. ID6607735Long-form Identifiermindat:1:5:6607735:8
GUID0
Full ReferenceTay, Arthur, Khuen Ho, Weng, Deng, Jiewen, Keng Lok, Boon (2006) Control of photoresist film thickness: Iterative feedback tuning approach. Computers & Chemical Engineering, 30. 572-579 doi:10.1016/j.compchemeng.2005.10.004
Plain TextTay, Arthur, Khuen Ho, Weng, Deng, Jiewen, Keng Lok, Boon (2006) Control of photoresist film thickness: Iterative feedback tuning approach. Computers & Chemical Engineering, 30. 572-579 doi:10.1016/j.compchemeng.2005.10.004
In(n.d.) Computers & Chemical Engineering Vol. 30. Elsevier BV

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