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Jablonski, A., Powell, C. J. (1993) Formalism and parameters for quantitative surface analysis by Auger electron spectroscopy and x-ray photoelectron spectroscopy. Surface and Interface Analysis, 20 (9). 771-786 doi:10.1002/sia.740200906

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Reference TypeJournal (article/letter/editorial)
TitleFormalism and parameters for quantitative surface analysis by Auger electron spectroscopy and x-ray photoelectron spectroscopy
JournalSurface and Interface Analysis
AuthorsJablonski, A.Author
Powell, C. J.Author
Year1993 (August)Volume20
Issue9
PublisherWiley
DOIdoi:10.1002/sia.740200906Search in ResearchGate
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Mindat Ref. ID6504353Long-form Identifiermindat:1:5:6504353:0
GUID0
Full ReferenceJablonski, A., Powell, C. J. (1993) Formalism and parameters for quantitative surface analysis by Auger electron spectroscopy and x-ray photoelectron spectroscopy. Surface and Interface Analysis, 20 (9). 771-786 doi:10.1002/sia.740200906
Plain TextJablonski, A., Powell, C. J. (1993) Formalism and parameters for quantitative surface analysis by Auger electron spectroscopy and x-ray photoelectron spectroscopy. Surface and Interface Analysis, 20 (9). 771-786 doi:10.1002/sia.740200906
In(1993, August) Surface and Interface Analysis Vol. 20 (9) Wiley

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Powell, C. J., Jablonski, A. (2002) Electron effective attenuation lengths for applications in Auger electron spectroscopy and x-ray photoelectron spectroscopy. Surface and Interface Analysis, 33 (3). 211-229 doi:10.1002/sia.1204
Smekal, Werner, Werner, Wolfgang S. M., Powell, Cedric J. (2005) Simulation of electron spectra for surface analysis (SESSA): a novel software tool for quantitative Auger-electron spectroscopy and X-ray photoelectron spectroscopy. Surface and Interface Analysis, 37 (11). 1059-1067 doi:10.1002/sia.2097
Powell, C. J. (2004) Summary of ISO/TC 201 Technical Report: ISO/TR 19319: 2003—Surface chemical analysis—Auger electron spectroscopy and x-ray photoelectron spectroscopy—Determination of lateral resolution, analysis area and sample area viewed by the analyser. Surface and Interface Analysis, 36 (7). 666-667 doi:10.1002/sia.1906
(1988) Standard guide for specimen handling in Auger electron spectroscopy and X-ray photoelectron spectroscopy (E1078-85). Surface and Interface Analysis, 11 (1). 119-124 doi:10.1002/sia.740110118
Powell, C. J. (2007) Summary of ISO/TC 201 Standard: XXIX. ISO 20903: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—methods used to determine peak intensities and information required when reporting results. Surface and Interface Analysis, 39 (5). 464-466 doi:10.1002/sia.2533
Murdoch, Billy J. (2026) Quantitative Analysis Using Dual Anode X‐Ray Photoelectron Spectroscopy. Surface and Interface Analysis, 58 (2). doi:10.1002/sia.70039
Werner, W. S. M., Störi, H. (1992) A new formalism for angle-resolved X-ray photoelectron spectroscopy (ARXPS) and Auger electron spectroscopy (ARAES) of non-crystalline solids taking elastic electron scattering into account. Surface and Interface Analysis, 19 (1). 83-88 doi:10.1002/sia.740190119
Walton, J., Fairley, N. (2004) Quantitative surface chemical-state microscopy by x-ray photoelectron spectroscopy. Surface and Interface Analysis, 36 (1). 89-91 doi:10.1002/sia.1654
Wolstenholme, J. (2008) Summary of ISO/TC 201 Standard: XXX. ISO 18516: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Determination of lateral resolution. Surface and Interface Analysis, 40 (5). 966-968 doi:10.1002/sia.2771
Cazaux, J., Moutou, S. (1984) The influence of X-ray-induced Auger electrons in quantitative electron-induced Auger spectroscopy. Surface and Interface Analysis, 6 (2). 62-67 doi:10.1002/sia.740060205
Faradzhev, Nadir S., Hill, Shannon B., Powell, Cedric J. (2017) Quantitative analysis of trace levels of surface contamination by X-ray photoelectron spectroscopy. Part II: Systematic uncertainties and absolute quantification. Surface and Interface Analysis, 49 (12). 1214-1224 doi:10.1002/sia.6289
 
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