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Hösler, W., Pamler, W. (1993) Effects of crystallinity on depth resolution in sputter depth profiles. Surface and Interface Analysis, 20 (8). 609-620 doi:10.1002/sia.740200802

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Reference TypeJournal (article/letter/editorial)
TitleEffects of crystallinity on depth resolution in sputter depth profiles
JournalSurface and Interface Analysis
AuthorsHösler, W.Author
Pamler, W.Author
Year1993 (July)Volume20
Issue8
PublisherWiley
DOIdoi:10.1002/sia.740200802Search in ResearchGate
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Mindat Ref. ID6504299Long-form Identifiermindat:1:5:6504299:3
GUID0
Full ReferenceHösler, W., Pamler, W. (1993) Effects of crystallinity on depth resolution in sputter depth profiles. Surface and Interface Analysis, 20 (8). 609-620 doi:10.1002/sia.740200802
Plain TextHösler, W., Pamler, W. (1993) Effects of crystallinity on depth resolution in sputter depth profiles. Surface and Interface Analysis, 20 (8). 609-620 doi:10.1002/sia.740200802
In(1993, July) Surface and Interface Analysis Vol. 20 (8) Wiley

See Also

These are possibly similar items as determined by title/reference text matching only.

Pamler, W., Wildenauer, E., Mitwalsky, A. (1990) Improved depth resolution in Auger depth profiles of TiN thin films by optimized sputtering parameters. Surface and Interface Analysis, 15 (10). 621-626 doi:10.1002/sia.740151010
Pamler, W., Wangemann, K. (1992) Depth profile analysis of aluminium metallization in microelectronics: Optimization of depth resolution. Surface and Interface Analysis, 18 (1). 52-58 doi:10.1002/sia.740180109
Scheithauer, U., Hösler, W., Riedl, G. (1993) Evaluation of AES depth profiles of thin-film systems by application of novel graphically interactive factor analysis software. Surface and Interface Analysis, 20 (6). 519-523 doi:10.1002/sia.740200606
Werner, H. W. (1982) The depth dependence of the depth resolution in sputter profiling. Surface and Interface Analysis, 4 (1). 1-7 doi:10.1002/sia.740040102
Henneberg, Matthias M. (1993) Influence of crystalline structure and amorphous materials in the depth resolution of sputter etching. Surface and Interface Analysis, 20 (13). 1051-1054 doi:10.1002/sia.740201304
Voigtmann, R., Moldenhauer, W. (1988) Quantification of sputter depth profiles by means of wedge crater sputtering—a new technique for depth scale calibration. Surface and Interface Analysis, 13 (2). 167-172 doi:10.1002/sia.740130209
Kesler, V., Hofmann, S. (2002) Improvement of the depth resolution in sputter depth profiling by elastic peak electron spectroscopy. Surface and Interface Analysis, 33 (8). 635-639 doi:10.1002/sia.1432
Hofmann, S., Liu, Y., Jian, W., Kang, H.L., Wang, J.Y. (2016) Depth resolution in sputter profiling revisited. Surface and Interface Analysis, 48 (13). 1354-1369 doi:10.1002/sia.6039
Kajiwara, K. (1994) Crystalline effects on depth resolution in AES depth profiling. Surface and Interface Analysis, 22 (1). 22-26 doi:10.1002/sia.740220108
Scheithauer, U. (2007) Improved sputter depth resolution in Auger composition-depth profiling of polycrystalline thin film systems using single grain depth profiling. Surface and Interface Analysis, 39 (1). 39-44 doi:10.1002/sia.2499
Makarov, V. V. (1993) Use of model depth resolution functions for the deconvolution of depth profiling data. Surface and Interface Analysis, 20 (10). 821-826 doi:10.1002/sia.740201004
 
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