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Itoh, T, Fujiwara, T, Katoh, Y, Fukunaga, K, Nonomura, S (2002) Influence of different carbon source gases on preparation and properties of a-Si1−XCX:H alloy films including μc-Si:H by hot-wire CVD. Journal of Non-Crystalline Solids, 299. 880-884 doi:10.1016/s0022-3093(01)01115-2

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of different carbon source gases on preparation and properties of a-Si1−XCX:H alloy films including μc-Si:H by hot-wire CVD
JournalJournal of Non-Crystalline Solids
AuthorsItoh, TAuthor
Fujiwara, TAuthor
Katoh, YAuthor
Fukunaga, KAuthor
Nonomura, SAuthor
Year2002 (April)Volume299
PublisherElsevier BV
DOIdoi:10.1016/s0022-3093(01)01115-2Search in ResearchGate
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Mindat Ref. ID640278Long-form Identifiermindat:1:5:640278:9
GUID0
Full ReferenceItoh, T, Fujiwara, T, Katoh, Y, Fukunaga, K, Nonomura, S (2002) Influence of different carbon source gases on preparation and properties of a-Si1−XCX:H alloy films including μc-Si:H by hot-wire CVD. Journal of Non-Crystalline Solids, 299. 880-884 doi:10.1016/s0022-3093(01)01115-2
Plain TextItoh, T, Fujiwara, T, Katoh, Y, Fukunaga, K, Nonomura, S (2002) Influence of different carbon source gases on preparation and properties of a-Si1−XCX:H alloy films including μc-Si:H by hot-wire CVD. Journal of Non-Crystalline Solids, 299. 880-884 doi:10.1016/s0022-3093(01)01115-2
In(2002) Journal of Non-Crystalline Solids Vol. 299. Elsevier BV

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Niikura, C, Poissant, Y, Gueunier, M.E, Kleider, J.P, Bourée, J.E (2002) Transport properties of hot-wire CVD μc-Si:H layers for solar cells. Journal of Non-Crystalline Solids, 299. 1179-1183 doi:10.1016/s0022-3093(01)01085-7
Balberg, I (2002) Phototransport spectroscopy of a-Si:H and μc-Si:H. Journal of Non-Crystalline Solids, 299. 531-535 doi:10.1016/s0022-3093(01)00968-1
Yoshida, N., Sobajima, Y., Kamiguchi, H., Iida, T., Hatano, T., Mori, H., Nakae, Y., Itoh, M., Masuda, A., Matsumura, H., Nonomura, S. (2002) Photoinduced volume expansion and contraction in a-Si:H films. Journal of Non-Crystalline Solids, 299. 516-520 doi:10.1016/s0022-3093(02)00934-1
Takimoto, K., Fukuta, A., Yamamoto, Y., Yoshida, N., Itoh, T., Nonomura, S. (2002) Linear thermal expansion coefficients of amorphous and microcrystalline silicon films. Journal of Non-Crystalline Solids, 299. 314-317 doi:10.1016/s0022-3093(02)00930-4
Nitta, S., Takeuchi, S., Ogawa, K., Furukawa, T., Itoh, T., Nonomura, S. (1991) Anomalous reflectance in random amorphous multilayers A-Si:H/Si1−XNX and classical localization of light ?. Journal of Non-Crystalline Solids, 137. 1095-1098 doi:10.1016/s0022-3093(05)80313-8
Ferreira, Isabel, Fortunato, Elvira, Pereira, Luı́s, Costa, M.Elisabete V., Martins, Rodrigo (2002) The properties of a-Si:H films deposited on Mylar substrates by hot-wire plasma assisted technique. Journal of Non-Crystalline Solids, 299. 30-35 doi:10.1016/s0022-3093(01)01173-5
Nitta, S, Takada, N, Sugiyama, K, Itoh, T, Nonomura, S (1998) Preparation and properties of photoconductive amorphous carbon nitride a-CN films: the layer-by-layer method. Journal of Non-Crystalline Solids, 227. 655-658 doi:10.1016/s0022-3093(98)00191-4
van Veen, M.K, van Veenendaal, P.A.T.T, van der Werf, C.H.M, Rath, J.K, Schropp, R.E.I (2002) a-Si:H/poly-Si tandem cells deposited by hot-wire CVD. Journal of Non-Crystalline Solids, 299. 1194-1197 doi:10.1016/s0022-3093(01)01087-0
Weis, T, Brehme, S, Kanschat, P, Fuhs, W, Lipperheide, R, Wille, U (2002) Barrier-limited carrier transport in highly n-doped μc-Si:H thin films. Journal of Non-Crystalline Solids, 299. 380-384 doi:10.1016/s0022-3093(01)00954-1
Itoh, T., Yamamoto, K., Ushikoshi, K., Nonomura, S., Nitta, S. (2000) Characterization and role of hydrogen in nc-Si:H. Journal of Non-Crystalline Solids, 266. 201-205 doi:10.1016/s0022-3093(99)00821-2
Nishikawa, S., Kakinuma, H., Fukuda, H., Watanabe, T., Nihei, K. (1985) Optical properties of a-Si:H/a-Si1−xCx:H and a-Si:H/a-SiNx:H superlattice. Journal of Non-Crystalline Solids, 77. 1077-1080 doi:10.1016/0022-3093(85)90844-0
 
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