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Rubino, Alfredo, delli Veneri, Paola, La Ferrara, Vera, De Rosa, Rosario, Tucci, Mario (2000) Amorphous/porous heterojunction on thin microcrystalline silicon. Journal of Non-Crystalline Solids, 266. 1044-1048 doi:10.1016/s0022-3093(99)00903-5

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Reference TypeJournal (article/letter/editorial)
TitleAmorphous/porous heterojunction on thin microcrystalline silicon
JournalJournal of Non-Crystalline Solids
AuthorsRubino, AlfredoAuthor
delli Veneri, PaolaAuthor
La Ferrara, VeraAuthor
De Rosa, RosarioAuthor
Tucci, MarioAuthor
Year2000 (May)Volume266
PublisherElsevier BV
DOIdoi:10.1016/s0022-3093(99)00903-5Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID638892Long-form Identifiermindat:1:5:638892:2
GUID0
Full ReferenceRubino, Alfredo, delli Veneri, Paola, La Ferrara, Vera, De Rosa, Rosario, Tucci, Mario (2000) Amorphous/porous heterojunction on thin microcrystalline silicon. Journal of Non-Crystalline Solids, 266. 1044-1048 doi:10.1016/s0022-3093(99)00903-5
Plain TextRubino, Alfredo, delli Veneri, Paola, La Ferrara, Vera, De Rosa, Rosario, Tucci, Mario (2000) Amorphous/porous heterojunction on thin microcrystalline silicon. Journal of Non-Crystalline Solids, 266. 1044-1048 doi:10.1016/s0022-3093(99)00903-5
In(2000) Journal of Non-Crystalline Solids Vol. 266. Elsevier BV

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Tucci, Mario, Rosa, Rosario De, Roca, Francesco, Caputo, Domenico, Cesare, Giampiero de (2000) Amorphous silicon p–i–n on p crystalline silicon photodetector in the visible and near infrared spectrum. Journal of Non-Crystalline Solids, 266. 1218-1222 doi:10.1016/s0022-3093(99)00928-x
Caputo, D, de Cesare, G, delli Veneri, P, Tucci, M (2002) Laser treatment of amorphous silicon junction field effect transistor channel. Journal of Non-Crystalline Solids, 299. 1326-1329 doi:10.1016/s0022-3093(01)01096-1
Böhmer, E, Lüth, H (2000) Photoelectron spectroscopy studies of microcrystalline/amorphous silicon interfaces. Journal of Non-Crystalline Solids, 266. 1038-1043 doi:10.1016/s0022-3093(99)00901-1
Droz, C, Goerlitzer, M, Wyrsch, N, Shah, A (2000) Electronic transport in hydrogenated microcrystalline silicon: similarities with amorphous silicon. Journal of Non-Crystalline Solids, 266. 319-324 doi:10.1016/s0022-3093(99)00718-8
Roca i Cabarrocas, P (2000) Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films. Journal of Non-Crystalline Solids, 266. 31-37 doi:10.1016/s0022-3093(99)00714-0
Böhm, Markus (2000) Imagers using amorphous silicon thin film on application specific integrated circuit technology. Journal of Non-Crystalline Solids, 266. 1145-1151 doi:10.1016/s0022-3093(99)00919-9
Stutzmann, Martin, Brandt, Martin S., Bayerl, Martin W. (2000) Spin-dependent processes in amorphous and microcrystalline silicon: a survey. Journal of Non-Crystalline Solids, 266. 1-22 doi:10.1016/s0022-3093(99)00871-6
Rezek, B, Nebel, C.E, Stutzmann, M (2000) Local photoconductivity correlation with granular structure of microcrystalline silicon thin films. Journal of Non-Crystalline Solids, 266. 315-318 doi:10.1016/s0022-3093(99)00717-6
delli Veneri, P, Privato, C, Terzini, E (2000) Changes of hydrogen evolution thermodynamics induced by He and H2 dilution in PECVD a-Si:H films: influence on thermal crystallization. Journal of Non-Crystalline Solids, 266. 635-639 doi:10.1016/s0022-3093(99)00757-7
Tucci, M., La Ferrara, V., Della Noce, M., Massera, E., Quercia, L. (2004) Bias enhanced sensitivity in amorphous/porous silicon heterojunction gas sensors. Journal of Non-Crystalline Solids, 338. 776-779 doi:10.1016/j.jnoncrysol.2004.03.089
Shimakawa, K (2000) Percolation-controlled electronic properties in microcrystalline silicon: effective medium approach. Journal of Non-Crystalline Solids, 266. 223-226 doi:10.1016/s0022-3093(99)00825-x
 
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