Zellama, K., Nedialkova, L., Bounouh, Y., Chahed, L., Benlahsen, M., Zeinert, A., Paret, V., Thèye, M.L. (1996) Hydrogen incorporation in device-quality a-Si:H deposited at low temperature. Journal of Non-Crystalline Solids, 198. 81-84 doi:10.1016/0022-3093(96)80017-2
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Hydrogen incorporation in device-quality a-Si:H deposited at low temperature | ||
| Journal | Journal of Non-Crystalline Solids | ||
| Authors | Zellama, K. | Author | |
| Nedialkova, L. | Author | ||
| Bounouh, Y. | Author | ||
| Chahed, L. | Author | ||
| Benlahsen, M. | Author | ||
| Zeinert, A. | Author | ||
| Paret, V. | Author | ||
| Thèye, M.L. | Author | ||
| Year | 1996 (May) | Volume | 198 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/0022-3093(96)80017-2Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 635630 | Long-form Identifier | mindat:1:5:635630:3 |
| GUID | 0 | ||
| Full Reference | Zellama, K., Nedialkova, L., Bounouh, Y., Chahed, L., Benlahsen, M., Zeinert, A., Paret, V., Thèye, M.L. (1996) Hydrogen incorporation in device-quality a-Si:H deposited at low temperature. Journal of Non-Crystalline Solids, 198. 81-84 doi:10.1016/0022-3093(96)80017-2 | ||
| Plain Text | Zellama, K., Nedialkova, L., Bounouh, Y., Chahed, L., Benlahsen, M., Zeinert, A., Paret, V., Thèye, M.L. (1996) Hydrogen incorporation in device-quality a-Si:H deposited at low temperature. Journal of Non-Crystalline Solids, 198. 81-84 doi:10.1016/0022-3093(96)80017-2 | ||
| In | (1996) Journal of Non-Crystalline Solids Vol. 198. Elsevier BV | ||
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