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Madan, A., Ovshinsky, S.R. (1980) Properties of amorphous Si:F:H alloys. Journal of Non-Crystalline Solids, 35. 171-181 doi:10.1016/0022-3093(80)90590-6

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Reference TypeJournal (article/letter/editorial)
TitleProperties of amorphous Si:F:H alloys
JournalJournal of Non-Crystalline Solids
AuthorsMadan, A.Author
Ovshinsky, S.R.Author
Year1980 (January)Volume35
PublisherElsevier BV
DOIdoi:10.1016/0022-3093(80)90590-6Search in ResearchGate
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Mindat Ref. ID613755Long-form Identifiermindat:1:5:613755:1
GUID0
Full ReferenceMadan, A., Ovshinsky, S.R. (1980) Properties of amorphous Si:F:H alloys. Journal of Non-Crystalline Solids, 35. 171-181 doi:10.1016/0022-3093(80)90590-6
Plain TextMadan, A., Ovshinsky, S.R. (1980) Properties of amorphous Si:F:H alloys. Journal of Non-Crystalline Solids, 35. 171-181 doi:10.1016/0022-3093(80)90590-6
In(1980) Journal of Non-Crystalline Solids Vol. 35. Elsevier BV

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Homma, K., Henisch, H.K., Ovshinsky, S.R. (1980) New experiments on threshold switching in chalcogenide and non-chalcogenide alloys. Journal of Non-Crystalline Solids, 35. 1105-1110 doi:10.1016/0022-3093(80)90347-6
Betts, F., Bienenstock, A., Ovshinsky, S.R. (1970) Radial distribution studies of amorphous GexTe1−x alloys. Journal of Non-Crystalline Solids, 4. 554-563 doi:10.1016/0022-3093(70)90093-1
Elliot, S.R., Davis, E.A. (1980) Trends in defect-controlled electronic properties of group V amorphous semiconductors. Journal of Non-Crystalline Solids, 35. 849-854 doi:10.1016/0022-3093(80)90306-3
Shur, M., Czubatyj, W., Madan, A. (1980) Schottky barrier profiles in amorphous silicon-based materials. Journal of Non-Crystalline Solids, 35. 731-736 doi:10.1016/0022-3093(80)90290-2
Bienenstock, A, Betts, F, Ovshinsky, S.R (1970) Structural studies of amorphous semiconductors. Journal of Non-Crystalline Solids, 2. 347-357 doi:10.1016/0022-3093(70)90150-x
Kakalios, J., Fritzsche, H., Ibaraki, N., Ovshinsky, S.R. (1984) Properties of amorphous semiconducting multilayer films. Journal of Non-Crystalline Solids, 66 (1) 339-344 doi:10.1016/0022-3093(84)90341-7
Feldman, Bernard J. (1980) Amorphous silicon-hydrogen-fluorine-oxygen alloys. Journal of Non-Crystalline Solids, 35. 309-312 doi:10.1016/0022-3093(80)90612-2
Ovshinsky, S.R., Klose, P.H. (1972) Imaging in amorphous materials by structural alteration. Journal of Non-Crystalline Solids, 8. 892-898 doi:10.1016/0022-3093(72)90243-8
Guha, S., Payson, J.S., Agarwal, S.C., Ovshinsky, S.R. (1987) Fluorinated amorphous silicon-germanium alloys deposited from disilane-germane mixture. Journal of Non-Crystalline Solids, 97. 1455-1458 doi:10.1016/0022-3093(87)90349-8
Golding, Brage (1980) Amorphous semiconductors at very low temperatures. Journal of Non-Crystalline Solids, 35. 1125-1134 doi:10.1016/0022-3093(80)90350-6
Lucovsky, G. (1980) Intimate valence alternation pairs in amorphous SiO2. Journal of Non-Crystalline Solids, 35. 825-830 doi:10.1016/0022-3093(80)90302-6
 
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