Pandian, Ramanathaswamy, Natarajan, Gomathi, Rajagopalan, S., Kamruddin, M., Tyagi, A. K. (2014) On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping. Applied Physics A, 116. 1905-1913 doi:10.1007/s00339-014-8351-1
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping | ||
| Journal | Applied Physics A | ||
| Authors | Pandian, Ramanathaswamy | Author | |
| Natarajan, Gomathi | Author | ||
| Rajagopalan, S. | Author | ||
| Kamruddin, M. | Author | ||
| Tyagi, A. K. | Author | ||
| Year | 2014 (September) | Volume | 116 |
| Publisher | Springer Science and Business Media LLC | ||
| DOI | doi:10.1007/s00339-014-8351-1Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 6017248 | Long-form Identifier | mindat:1:5:6017248:4 |
| GUID | 0 | ||
| Full Reference | Pandian, Ramanathaswamy, Natarajan, Gomathi, Rajagopalan, S., Kamruddin, M., Tyagi, A. K. (2014) On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping. Applied Physics A, 116. 1905-1913 doi:10.1007/s00339-014-8351-1 | ||
| Plain Text | Pandian, Ramanathaswamy, Natarajan, Gomathi, Rajagopalan, S., Kamruddin, M., Tyagi, A. K. (2014) On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping. Applied Physics A, 116. 1905-1913 doi:10.1007/s00339-014-8351-1 | ||
| In | (2014) Applied Physics A Vol. 116. Springer Science and Business Media LLC | ||
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