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Hwang, David J., Xiang, Bin, Ryu, Sang-Gil, Dubon, Oscar, Minor, Andrew M., Grigoropoulos, Costas P. (2011) In-situ monitoring of optical near-field material processing by electron microscopes. Applied Physics A, 105. 317-321 doi:10.1007/s00339-011-6615-6

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Reference TypeJournal (article/letter/editorial)
TitleIn-situ monitoring of optical near-field material processing by electron microscopes
JournalApplied Physics A
AuthorsHwang, David J.Author
Xiang, BinAuthor
Ryu, Sang-GilAuthor
Dubon, OscarAuthor
Minor, Andrew M.Author
Grigoropoulos, Costas P.Author
Year2011 (November)Volume105
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-011-6615-6Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID6015407Long-form Identifiermindat:1:5:6015407:1
GUID0
Full ReferenceHwang, David J., Xiang, Bin, Ryu, Sang-Gil, Dubon, Oscar, Minor, Andrew M., Grigoropoulos, Costas P. (2011) In-situ monitoring of optical near-field material processing by electron microscopes. Applied Physics A, 105. 317-321 doi:10.1007/s00339-011-6615-6
Plain TextHwang, David J., Xiang, Bin, Ryu, Sang-Gil, Dubon, Oscar, Minor, Andrew M., Grigoropoulos, Costas P. (2011) In-situ monitoring of optical near-field material processing by electron microscopes. Applied Physics A, 105. 317-321 doi:10.1007/s00339-011-6615-6
In(2011) Applied Physics A Vol. 105. Springer Science and Business Media LLC

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