Kettle, J., Hoyle, R. T., Dimov, S. (2009) Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching. Applied Physics A, 96. 819-825 doi:10.1007/s00339-009-5319-7

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Reference Type	Journal (article/letter/editorial)
Title	Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching
Journal	Applied Physics A
Authors	Kettle, J.		Author
	Hoyle, R. T.		Author
	Dimov, S.		Author
Year	2009 (September)	Volume	96
Publisher	Springer Science and Business Media LLC
DOI	doi:10.1007/s00339-009-5319-7Search in ResearchGate
	Generate Citation Formats
Mindat Ref. ID	6014107	Long-form Identifier	mindat:1:5:6014107:7
GUID	0
Full Reference	Kettle, J., Hoyle, R. T., Dimov, S. (2009) Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching. Applied Physics A, 96. 819-825 doi:10.1007/s00339-009-5319-7
Plain Text	Kettle, J., Hoyle, R. T., Dimov, S. (2009) Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching. Applied Physics A, 96. 819-825 doi:10.1007/s00339-009-5319-7
In	(2009) Applied Physics A Vol. 96. Springer Science and Business Media LLC

	*Long, Brian K., Keitz, B. Keith, Willson, C. Grant (2007) Materials for step and flash imprint lithography (S-FIL®). Journal of Materials Chemistry, 17. 3575pp. doi:10.1039/b705388f*
	Neretina, S., Hughes, R. A., Stortz, G., Preston, J. S., Mascher, P. (2011) The rapid prototyping of textured amorphous surfaces for the graphoepitaxial deposition of CdTe films using focused ion beam lithography. Applied Physics A, 102. 259-264 doi:10.1007/s00339-010-6171-5
	*Choquette, Kent D., Harriott, Lloyd R. (1993) Dry lithography using focused ion beam implantation and reactive ion etching of SiO2. Applied Physics Letters, 62 (25). 3294-3296 doi:10.1063/1.109623*
	Chiromawa, Nura Liman, Ibrahim, Kamarulazizi (2016) Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching. Applied Physics A, 122. doi:10.1007/s00339-016-9649-y
	*Yeo, J. S., Mathai, S., Tan, M., King, L. (2009) Fabrication of pellicle beam splitters for optical bus application. Applied Physics A, 95. 1067-1072 doi:10.1007/s00339-009-5150-1*
	Wang, Li, Zhang, Sasa, Wang, Qingpu, Chen, Jiaqi, Jiang, Wei, Chen, Ray T. (2009) Fabrication of three-dimensional (3D) woodpile structure photonic crystal with layer by layer e-beam lithography. Applied Physics A, 95. 329-334 doi:10.1007/s00339-009-5076-7
	Kim, S.-J., Latyshev, Yu. I., Yamashita, T. (1999) Submicron stacked-junction fabrication from Bi2Sr2CaCu2O8+δ whiskers by focused-ion-beam etching. Applied Physics Letters, 74 (8). 1156-1158 doi:10.1063/1.123472
	Leong, Eunice S. P., Deng, J., Liu, Y. J., Teng, J. H. (2014) Dual metamaterial structures generated from an one-step fabrication using stencil lithography. Applied Physics A, 116. 907-912 doi:10.1007/s00339-014-8461-9
	Katoh, T., Nagamune, Y., Li, G. P., Fukatsu, S., Shiraki, Y., Ito, R. (1990) Fabrication of ultrafine gratings on GaAs by electron beam lithography and two‐step wet chemical etching. Applied Physics Letters, 57 (12). 1212-1214 doi:10.1063/1.103488
	Chauhan, Siddharth, Palmieri, Frank, Bonnecaze, Roger T., Willson, C. Grant (2009) Pinning at template feature edges for step and flash imprint lithography. Journal of Applied Physics, 106 (3). 34902pp. doi:10.1063/1.3122599
	Han, J, Choi, S, Lim, J, Lee, B S, Kang, S (2009) Fabrication of transparent conductive tracks and patterns on flexible substrate using a continuous UV roll imprint lithography. Journal of Physics D: Applied Physics, 42. 115503pp. doi:10.1088/0022-3727/42/11/115503

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Kettle, J., Hoyle, R. T., Dimov, S. (2009) Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused ion-beam etching. Applied Physics A, 96. 819-825 doi:10.1007/s00339-009-5319-7

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