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Liu, Lei, Sridhar, Shyam, Zhu, Weiye, Donnelly, Vincent M., Economou, Demetre J., Logue, Michael D., Kushner, Mark J. (2015) External control of electron energy distributions in a dual tandem inductively coupled plasma. Journal of Applied Physics, 118 (8). 83303pp. doi:10.1063/1.4928870

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Reference TypeJournal (article/letter/editorial)
TitleExternal control of electron energy distributions in a dual tandem inductively coupled plasma
JournalJournal of Applied Physics
AuthorsLiu, LeiAuthor
Sridhar, ShyamAuthor
Zhu, WeiyeAuthor
Donnelly, Vincent M.Author
Economou, Demetre J.Author
Logue, Michael D.Author
Kushner, Mark J.Author
Year2015 (August 28)Volume118
Issue8
PublisherAIP Publishing
DOIdoi:10.1063/1.4928870Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5203741Long-form Identifiermindat:1:5:5203741:4
GUID0
Full ReferenceLiu, Lei, Sridhar, Shyam, Zhu, Weiye, Donnelly, Vincent M., Economou, Demetre J., Logue, Michael D., Kushner, Mark J. (2015) External control of electron energy distributions in a dual tandem inductively coupled plasma. Journal of Applied Physics, 118 (8). 83303pp. doi:10.1063/1.4928870
Plain TextLiu, Lei, Sridhar, Shyam, Zhu, Weiye, Donnelly, Vincent M., Economou, Demetre J., Logue, Michael D., Kushner, Mark J. (2015) External control of electron energy distributions in a dual tandem inductively coupled plasma. Journal of Applied Physics, 118 (8). 83303pp. doi:10.1063/1.4928870
In(2015, August) Journal of Applied Physics Vol. 118 (8) AIP Publishing

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Liu, Lei, Sridhar, Shyam, Donnelly, Vincent M, Economou, Demetre J (2015) Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP. Journal of Physics D: Applied Physics, 48. 485201pp. doi:10.1088/0022-3727/48/48/485201
Zhu, Weiye, Sridhar, Shyam, Liu, Lei, Hernandez, Eduardo, Donnelly, Vincent M., Economou, Demetre J. (2014) Photo-assisted etching of silicon in chlorine- and bromine-containing plasmas. Journal of Applied Physics, 115 (20). 203303pp. doi:10.1063/1.4878895
Logue, Michael D., Kushner, Mark J. (2015) Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power. Journal of Applied Physics, 117 (4). 43301pp. doi:10.1063/1.4904935
Xu, Lin, Sadeghi, Nader, Donnelly, Vincent M., Economou, Demetre J. (2007) Nickel atom and ion densities in an inductively coupled plasma with an internal coil. Journal of Applied Physics, 101 (1). 13304pp. doi:10.1063/1.2401659
Karakas, Erdinc, Donnelly, Vincent M., Economou, Demetre J. (2013) Optical emission spectroscopy and Langmuir probe diagnostics of CH3F/O2 inductively coupled plasmas. Journal of Applied Physics, 113 (21). 213301pp. doi:10.1063/1.4807298
Diomede, Paola, Economou, Demetre J., Donnelly, Vincent M. (2011) Particle-in-cell simulation of ion energy distributions on an electrode by applying tailored bias waveforms in the afterglow of a pulsed plasma. Journal of Applied Physics, 109 (8). 83302pp. doi:10.1063/1.3573488
Karakas, Erdinc, Donnelly, Vincent M., Economou, Demetre J. (2013) Abrupt transitions in species number densities and plasma parameters in a CH3F/O2inductively coupled plasma. Applied Physics Letters, 102 (3). 34107pp. doi:10.1063/1.4789435
Kinder, Ronald L., Kushner, Mark J. (2001) Noncollisional heating and electron energy distributions in magnetically enhanced inductively coupled and helicon plasma sources. Journal of Applied Physics, 90 (8). 3699-3712 doi:10.1063/1.1400091
Diomede, Paola, Economou, Demetre J., Donnelly, Vincent M. (2012) Rapid calculation of the ion energy distribution on a plasma electrode. Journal of Applied Physics, 111 (12). 123306pp. doi:10.1063/1.4728997
Lanham, Steven J., Kushner, Mark J. (2017) Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors. Journal of Applied Physics, 122 (8). 83301pp. doi:10.1063/1.4993785
Vasenkov, Alex V., Kushner, Mark J. (2003) Angular anisotropy of electron energy distributions in inductively coupled plasmas. Journal of Applied Physics, 94 (9). 5522-5529 doi:10.1063/1.1614428
 
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