Gunning, Brendan P., Clinton, Evan A., Merola, Joseph J., Doolittle, W. Alan, Bresnahan, Rich C. (2015) Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9 μm/h by plasma-assisted molecular beam epitaxy. Journal of Applied Physics, 118 (15). 155302pp. doi:10.1063/1.4933278
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9 μm/h by plasma-assisted molecular beam epitaxy | ||
| Journal | Journal of Applied Physics | ||
| Authors | Gunning, Brendan P. | Author | |
| Clinton, Evan A. | Author | ||
| Merola, Joseph J. | Author | ||
| Doolittle, W. Alan | Author | ||
| Bresnahan, Rich C. | Author | ||
| Year | 2015 (October 21) | Volume | 118 |
| Issue | 15 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.4933278Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5202874 | Long-form Identifier | mindat:1:5:5202874:4 |
| GUID | 0 | ||
| Full Reference | Gunning, Brendan P., Clinton, Evan A., Merola, Joseph J., Doolittle, W. Alan, Bresnahan, Rich C. (2015) Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9 μm/h by plasma-assisted molecular beam epitaxy. Journal of Applied Physics, 118 (15). 155302pp. doi:10.1063/1.4933278 | ||
| Plain Text | Gunning, Brendan P., Clinton, Evan A., Merola, Joseph J., Doolittle, W. Alan, Bresnahan, Rich C. (2015) Control of ion content and nitrogen species using a mixed chemistry plasma for GaN grown at extremely high growth rates >9 μm/h by plasma-assisted molecular beam epitaxy. Journal of Applied Physics, 118 (15). 155302pp. doi:10.1063/1.4933278 | ||
| In | (2015, October) Journal of Applied Physics Vol. 118 (15) AIP Publishing | ||
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