Díaz, B., Abramof, E., Castro, R. M., Ueda, M., Reuther, H. (2007) Strain profile of (001) silicon implanted with nitrogen by plasma immersion. Journal of Applied Physics, 101 (10). 103523pp. doi:10.1063/1.2734957
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Strain profile of (001) silicon implanted with nitrogen by plasma immersion | ||
| Journal | Journal of Applied Physics | ||
| Authors | Díaz, B. | Author | |
| Abramof, E. | Author | ||
| Castro, R. M. | Author | ||
| Ueda, M. | Author | ||
| Reuther, H. | Author | ||
| Year | 2007 (May 15) | Volume | 101 |
| Issue | 10 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2734957Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5145454 | Long-form Identifier | mindat:1:5:5145454:4 |
| GUID | 0 | ||
| Full Reference | Díaz, B., Abramof, E., Castro, R. M., Ueda, M., Reuther, H. (2007) Strain profile of (001) silicon implanted with nitrogen by plasma immersion. Journal of Applied Physics, 101 (10). 103523pp. doi:10.1063/1.2734957 | ||
| Plain Text | Díaz, B., Abramof, E., Castro, R. M., Ueda, M., Reuther, H. (2007) Strain profile of (001) silicon implanted with nitrogen by plasma immersion. Journal of Applied Physics, 101 (10). 103523pp. doi:10.1063/1.2734957 | ||
| In | (2007, May) Journal of Applied Physics Vol. 101 (10) AIP Publishing | ||
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