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Weiß, V., Seeger, S., Ellmer, K., Mientus, R. (2007) Reactive magnetron sputtering of tungsten disulfide (WS2−x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry. Journal of Applied Physics, 101 (10). 103502pp. doi:10.1063/1.2716395

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Reference TypeJournal (article/letter/editorial)
TitleReactive magnetron sputtering of tungsten disulfide (WS2−x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry
JournalJournal of Applied Physics
AuthorsWeiß, V.Author
Seeger, S.Author
Ellmer, K.Author
Mientus, R.Author
Year2007 (May 15)Volume101
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.2716395Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5145204Long-form Identifiermindat:1:5:5145204:1
GUID0
Full ReferenceWeiß, V., Seeger, S., Ellmer, K., Mientus, R. (2007) Reactive magnetron sputtering of tungsten disulfide (WS2−x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry. Journal of Applied Physics, 101 (10). 103502pp. doi:10.1063/1.2716395
Plain TextWeiß, V., Seeger, S., Ellmer, K., Mientus, R. (2007) Reactive magnetron sputtering of tungsten disulfide (WS2−x) films: Influence of deposition parameters on texture, microstructure, and stoichiometry. Journal of Applied Physics, 101 (10). 103502pp. doi:10.1063/1.2716395
In(2007, May) Journal of Applied Physics Vol. 101 (10) AIP Publishing

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Ellmer, K., Mientus, R., Seeger, S., Wei�, V. (2004) Highly (001)-textured WS2?x films prepared by reactive radio frequency magnetron sputtering. physica status solidi (a), 201 (14). doi:10.1002/pssa.200409067
Brunken, S., Mientus, R., Seeger, S., Ellmer, K. (2008) The mechanism of nickel sulfide induced rapid crystallization of highly textured tungsten disulfide (WS2) thin films: An in situ real-time diffraction study. Journal of Applied Physics, 103 (6). 63501pp. doi:10.1063/1.2875679
Ellmer, K., Seeger, S., Sieber, I., Bohne, W., Röhrich, J., Strub, E., Mientus, R. (2006) Reactive magnetron sputtering of highly (001)-textured WS2−xfilms: Influence of Ne+, Ar+and Xe+ion bombardment on the film growth. physica status solidi (a), 203 (3). 439 doi:10.1002/pssa.200690005
Ellmer, K., Seeger, S., Sieber, I., Bohne, W., Röhrich, J., Strub, E., Mientus, R. (2006) Reactive magnetron sputtering of highly (001)-textured WS2−xfilms: Influence of Ne+, Ar+and Xe+ion bombardment on the film growth. physica status solidi (a), 203 (3). 497-503 doi:10.1002/pssa.200521363
Ellmer, K., Kudella, F., Mientus, R., Schieck, R., Fiechter, S. (1993) Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions. Applied Surface Science, 70. 707-711 doi:10.1016/0169-4332(93)90606-c
Ellmer, K., Stock, C., Diesner, K., Sieber, I. (1997) Deposition of c⊥-oriented tungsten disulfide (WS2) films by reactive DC magnetron sputtering from a W-target in Ar/H2S. Journal of Crystal Growth, 182 (3). 389-393 doi:10.1016/s0022-0248(97)00355-2
Seeger, S., Harbauer, K., Ellmer, K. (2009) Ion-energy distributions at a substrate in reactive magnetron sputtering discharges in Ar/H2S from copper, indium, and tungsten targets. Journal of Applied Physics, 105 (5). 53305pp. doi:10.1063/1.3086618
Ellmer, K. (2008) Preparation routes based on magnetron sputtering for tungsten disulfide (WS2) films for thin-film solar cells. physica status solidi (b), 245 (9). 1745-1760 doi:10.1002/pssb.200879545
Weiss, V., Bohne, W., Röhrich, J., Strub, E., Bloeck, U., Sieber, I., Ellmer, K., Mientus, R., Porsch, F. (2004) Reactive magnetron sputtering of molybdenum sulfide thin films:In situsynchrotron x-ray diffraction and transmission electron microscopy study. Journal of Applied Physics, 95 (12). 7665-7673 doi:10.1063/1.1736323
Ellmer, K., Mientus, R., Weiß, V., Rossner, H. (2001) Setup for in situ X-ray diffraction studies of thin film growth by magnetron sputtering. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 467. 1041-1044 doi:10.1016/s0168-9002(01)00637-4
Das, S. R., Williams, D. F., Webb, J. B. (1983) Dependence of the microstructure of amorphous silicon thin films prepared by planar rf magnetron sputtering on deposition parameters. Journal of Applied Physics, 54 (6). 3101-3105 doi:10.1063/1.332463
 
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