Her, Yung-Chiun, Chen, Chih-Wei, Wu, Chun-Lin (2006) Comparison of crystallization kinetics in a-Si∕Cu and a-Si∕Al bilayer recording films under thermal annealing and pulsed laser irradiation. Journal of Applied Physics, 99 (11). 113512pp. doi:10.1063/1.2200427
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Comparison of crystallization kinetics in a-Si∕Cu and a-Si∕Al bilayer recording films under thermal annealing and pulsed laser irradiation | ||
| Journal | Journal of Applied Physics | ||
| Authors | Her, Yung-Chiun | Author | |
| Chen, Chih-Wei | Author | ||
| Wu, Chun-Lin | Author | ||
| Year | 2006 (June) | Volume | 99 |
| Issue | 11 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2200427Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5137352 | Long-form Identifier | mindat:1:5:5137352:2 |
| GUID | 0 | ||
| Full Reference | Her, Yung-Chiun, Chen, Chih-Wei, Wu, Chun-Lin (2006) Comparison of crystallization kinetics in a-Si∕Cu and a-Si∕Al bilayer recording films under thermal annealing and pulsed laser irradiation. Journal of Applied Physics, 99 (11). 113512pp. doi:10.1063/1.2200427 | ||
| Plain Text | Her, Yung-Chiun, Chen, Chih-Wei, Wu, Chun-Lin (2006) Comparison of crystallization kinetics in a-Si∕Cu and a-Si∕Al bilayer recording films under thermal annealing and pulsed laser irradiation. Journal of Applied Physics, 99 (11). 113512pp. doi:10.1063/1.2200427 | ||
| In | (2006, June) Journal of Applied Physics Vol. 99 (11) AIP Publishing | ||
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