Kumagai, Y., Nagashima, T., Murakami, H., Takada, K., Koukitu, A. (2008) Characterization of a freestanding AlN substrate prepared by hydride vapor phase epitaxy. physica status solidi (c), 5 (6). 1512-1514 doi:10.1002/pssc.200778432
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Characterization of a freestanding AlN substrate prepared by hydride vapor phase epitaxy | ||
| Journal | physica status solidi (c) | ||
| Authors | Kumagai, Y. | Author | |
| Nagashima, T. | Author | ||
| Murakami, H. | Author | ||
| Takada, K. | Author | ||
| Koukitu, A. | Author | ||
| Year | 2008 (May) | Volume | 5 |
| Issue | 6 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1002/pssc.200778432Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5116051 | Long-form Identifier | mindat:1:5:5116051:1 |
| GUID | 0 | ||
| Full Reference | Kumagai, Y., Nagashima, T., Murakami, H., Takada, K., Koukitu, A. (2008) Characterization of a freestanding AlN substrate prepared by hydride vapor phase epitaxy. physica status solidi (c), 5 (6). 1512-1514 doi:10.1002/pssc.200778432 | ||
| Plain Text | Kumagai, Y., Nagashima, T., Murakami, H., Takada, K., Koukitu, A. (2008) Characterization of a freestanding AlN substrate prepared by hydride vapor phase epitaxy. physica status solidi (c), 5 (6). 1512-1514 doi:10.1002/pssc.200778432 | ||
| In | (2008, May) physica status solidi (c) Vol. 5 (6) Wiley | ||
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