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Kim, Soo In, Lee, Chang Woo (2007) Characteristics of W-C-N thin films on Si as a role of diffusion barrier for La0.67Sr0.33MnO3manganese oxide layer. physica status solidi (c), 4 (12). 4475-4479 doi:10.1002/pssc.200777240

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Reference TypeJournal (article/letter/editorial)
TitleCharacteristics of W-C-N thin films on Si as a role of diffusion barrier for La0.67Sr0.33MnO3manganese oxide layer
Journalphysica status solidi (c)
AuthorsKim, Soo InAuthor
Lee, Chang WooAuthor
Year2007 (December)Volume4
Issue12
PublisherWiley
DOIdoi:10.1002/pssc.200777240Search in ResearchGate
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Mindat Ref. ID5113459Long-form Identifiermindat:1:5:5113459:8
GUID0
Full ReferenceKim, Soo In, Lee, Chang Woo (2007) Characteristics of W-C-N thin films on Si as a role of diffusion barrier for La0.67Sr0.33MnO3manganese oxide layer. physica status solidi (c), 4 (12). 4475-4479 doi:10.1002/pssc.200777240
Plain TextKim, Soo In, Lee, Chang Woo (2007) Characteristics of W-C-N thin films on Si as a role of diffusion barrier for La0.67Sr0.33MnO3manganese oxide layer. physica status solidi (c), 4 (12). 4475-4479 doi:10.1002/pssc.200777240
In(2007, December) physica status solidi (c) Vol. 4 (12) Wiley

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