Zaumseil, P. (1998) High Resolution Determination of the Ge Depth Profile in SiGe Heterobipolar Transistor Structures by X-Ray Diffractometry. physica status solidi (a), 165 (1). 195-204 doi:10.1002/(sici)1521-396x(199801)165:1<195::aid-pssa195>3.0.co;2-i
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | High Resolution Determination of the Ge Depth Profile in SiGe Heterobipolar Transistor Structures by X-Ray Diffractometry | ||
| Journal | physica status solidi (a) | ||
| Authors | Zaumseil, P. | Author | |
| Year | 1998 (January) | Volume | 165 |
| Issue | 1 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1002/(sici)1521-396x(199801)165:1<195::aid-pssa195>3.0.co;2-iSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 5083223 | Long-form Identifier | mindat:1:5:5083223:1 |
| GUID | 0 | ||
| Full Reference | Zaumseil, P. (1998) High Resolution Determination of the Ge Depth Profile in SiGe Heterobipolar Transistor Structures by X-Ray Diffractometry. physica status solidi (a), 165 (1). 195-204 doi:10.1002/(sici)1521-396x(199801)165:1<195::aid-pssa195>3.0.co;2-i | ||
| Plain Text | Zaumseil, P. (1998) High Resolution Determination of the Ge Depth Profile in SiGe Heterobipolar Transistor Structures by X-Ray Diffractometry. physica status solidi (a), 165 (1). 195-204 doi:10.1002/(sici)1521-396x(199801)165:13.0.co;2-i | ||
| In | (1998, January) physica status solidi (a) Vol. 165 (1) Wiley | ||
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