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TOKARZ, A., WIECZOREK, P., LIS, A.K., MORGIEL, J. (2010) Microstructure of electrodeposited NiFe/Cu multilayers. Journal of Microscopy, 237 (3). 456-460 doi:10.1111/j.1365-2818.2009.03293.x

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Reference TypeJournal (article/letter/editorial)
TitleMicrostructure of electrodeposited NiFe/Cu multilayers
JournalJournal of Microscopy
AuthorsTOKARZ, A.Author
WIECZOREK, P.Author
LIS, A.K.Author
MORGIEL, J.Author
Year2010 (March)Volume237
Issue3
PublisherWiley
DOIdoi:10.1111/j.1365-2818.2009.03293.xSearch in ResearchGate
Generate Citation Formats
Mindat Ref. ID4935546Long-form Identifiermindat:1:5:4935546:2
GUID0
Full ReferenceTOKARZ, A., WIECZOREK, P., LIS, A.K., MORGIEL, J. (2010) Microstructure of electrodeposited NiFe/Cu multilayers. Journal of Microscopy, 237 (3). 456-460 doi:10.1111/j.1365-2818.2009.03293.x
Plain TextTOKARZ, A., WIECZOREK, P., LIS, A.K., MORGIEL, J. (2010) Microstructure of electrodeposited NiFe/Cu multilayers. Journal of Microscopy, 237 (3). 456-460 doi:10.1111/j.1365-2818.2009.03293.x
In(2010, March) Journal of Microscopy Vol. 237 (3) Wiley

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