Zhang, Zesheng, Cai, Hao, Gan, Di, Hu, Weijie, Yang, Junwei, Liu, Xiaozhi, Guo, Yunlong, Guo, Liwei, Wang, Wenjun, Chen, Xiaolong (2019) A new method to characterize underlying scratches on SiC wafers. CrystEngComm, 21. 1200-1204 doi:10.1039/c8ce01700j
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | A new method to characterize underlying scratches on SiC wafers | ||
| Journal | CrystEngComm | ||
| Authors | Zhang, Zesheng | Author | |
| Cai, Hao | Author | ||
| Gan, Di | Author | ||
| Hu, Weijie | Author | ||
| Yang, Junwei | Author | ||
| Liu, Xiaozhi | Author | ||
| Guo, Yunlong | Author | ||
| Guo, Liwei | Author | ||
| Wang, Wenjun | Author | ||
| Chen, Xiaolong | Author | ||
| Year | 2019 | Volume | 21 |
| Publisher | Royal Society of Chemistry (RSC) | ||
| DOI | doi:10.1039/c8ce01700jSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4455082 | Long-form Identifier | mindat:1:5:4455082:2 |
| GUID | 0 | ||
| Full Reference | Zhang, Zesheng, Cai, Hao, Gan, Di, Hu, Weijie, Yang, Junwei, Liu, Xiaozhi, Guo, Yunlong, Guo, Liwei, Wang, Wenjun, Chen, Xiaolong (2019) A new method to characterize underlying scratches on SiC wafers. CrystEngComm, 21. 1200-1204 doi:10.1039/c8ce01700j | ||
| Plain Text | Zhang, Zesheng, Cai, Hao, Gan, Di, Hu, Weijie, Yang, Junwei, Liu, Xiaozhi, Guo, Yunlong, Guo, Liwei, Wang, Wenjun, Chen, Xiaolong (2019) A new method to characterize underlying scratches on SiC wafers. CrystEngComm, 21. 1200-1204 doi:10.1039/c8ce01700j | ||
| In | (2019) CrystEngComm Vol. 21. Royal Society of Chemistry (RSC) | ||
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