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Reijnen, Liesbeth, Meester, Ben, de Lange, Frits, Schoonman, Joop, Goossens, Albert (2005) Comparison of CuxS Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition. Chemistry of Materials, 17. 2724-2728 doi:10.1021/cm035238b

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Reference TypeJournal (article/letter/editorial)
TitleComparison of CuxS Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition
JournalChemistry of Materials
AuthorsReijnen, LiesbethAuthor
Meester, BenAuthor
de Lange, FritsAuthor
Schoonman, JoopAuthor
Goossens, AlbertAuthor
Year2005 (May)Volume17
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/cm035238bSearch in ResearchGate
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Mindat Ref. ID4299815Long-form Identifiermindat:1:5:4299815:2
GUID0
Full ReferenceReijnen, Liesbeth, Meester, Ben, de Lange, Frits, Schoonman, Joop, Goossens, Albert (2005) Comparison of CuxS Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition. Chemistry of Materials, 17. 2724-2728 doi:10.1021/cm035238b
Plain TextReijnen, Liesbeth, Meester, Ben, de Lange, Frits, Schoonman, Joop, Goossens, Albert (2005) Comparison of CuxS Films Grown by Atomic Layer Deposition and Chemical Vapor Deposition. Chemistry of Materials, 17. 2724-2728 doi:10.1021/cm035238b
In(2005) Chemistry of Materials Vol. 17. American Chemical Society (ACS)

See Also

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Reijnen, Liesbeth, Meester, Ben, Goossens, Albert, Schoonman, Joop (2005) Chemical Vapor Deposition of CuxS:  Surface Contamination by Reaction Products. Chemistry of Materials, 17. 4142-4148 doi:10.1021/cm035276v
Reijnen, Liesbeth, Meester, Ben, Goossens, Albert, Schoonman, Joop (2000) In Situ Mass Spectrometric Study of Pyrite (FeS[sub 2]) Thin Film Deposition with Metallorganic Chemical Vapor Deposition. Journal of the Electrochemical Society, 147. 1803pp. doi:10.1149/1.1393437
Meester, B., Reijnen, L., de Lange, F., Goossens, A., Schoonman, J. (2001) Low pressure chemical vapor deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001330
Reijnen, L., Meester, B., Goossens, A., Schoonman, J. (2001) Atomic layer deposition of CuxS. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013138
Reijnen, Liesbeth, Feddes, Bas, Vredenberg, Arjan M., Schoonman, Joop, Goossens, Albert (2004) Rutherford Backscattering Spectroscopy Study of TiO2/Cu1.8S Nanocomposites Obtained by Atomic Layer Deposition. The Journal of Physical Chemistry B, 108 (26). 9133-9137 doi:10.1021/jp037641b
Meester, B., Reijnen, L., Goossens, A., Schoonman, J. (1999) Synthesis of pyrite (FeS2) thin films by low pressure metal-organic chemical vapor deposition. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999877
Meester, B., Reijnen, L., Goossens, A., Schoonman, J. (2001) Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013144
Nomura, Mikihiro, Meester, Ben, Schoonman, Joop, Kapteijn, Freek, Moulijn, Jacob A. (2003) Improvement of Thermal Stability of Porous Titania Films Prepared by Electrostatic Sol-Spray Deposition (ESSD). Chemistry of Materials, 15. 1283-1288 doi:10.1021/cm0208152
Mani, Anahita, Schoonman, Joop, Goossens, Albert (2005) Photoluminescence Study of Sexithiophene Thin Films. The Journal of Physical Chemistry B, 109 (11). 4829-4836 doi:10.1021/jp045916x
Besling, W. F. A., Goossens, A., Meester, B., Schoonman, J. (1998) Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films. Journal of Applied Physics, 83 (1). 544-553 doi:10.1063/1.366669
Meester, B., du Bois, R. A., Goossens, A., Schoonman, J. (1999) Phase controlled low-pressure chemical vapor deposition of iron(di)sulfide. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999853
 
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