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Lewkebandara, T. Suren, Proscia, James W., Winter, Charles H. (1995) Precursor for the Low-Temperature Deposition of Titanium Phosphide Films. Chemistry of Materials, 7. 1053-1054 doi:10.1021/cm00054a003

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Reference TypeJournal (article/letter/editorial)
TitlePrecursor for the Low-Temperature Deposition of Titanium Phosphide Films
JournalChemistry of Materials
AuthorsLewkebandara, T. SurenAuthor
Proscia, James W.Author
Winter, Charles H.Author
Year1995 (June)Volume7
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/cm00054a003Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID4294075Long-form Identifiermindat:1:5:4294075:7
GUID0
Full ReferenceLewkebandara, T. Suren, Proscia, James W., Winter, Charles H. (1995) Precursor for the Low-Temperature Deposition of Titanium Phosphide Films. Chemistry of Materials, 7. 1053-1054 doi:10.1021/cm00054a003
Plain TextLewkebandara, T. Suren, Proscia, James W., Winter, Charles H. (1995) Precursor for the Low-Temperature Deposition of Titanium Phosphide Films. Chemistry of Materials, 7. 1053-1054 doi:10.1021/cm00054a003
In(1995) Chemistry of Materials Vol. 7. American Chemical Society (ACS)

See Also

These are possibly similar items as determined by title/reference text matching only.

Winter, Charles H., Lewkebandara, T. Suren, Proscia, James W. (1992) Low-temperature atmospheric pressure chemical vapor deposition of titanium disulfide films. Chemistry of Materials, 4. 1144-1146 doi:10.1021/cm00024a007
Winter, Charles H., Sheridan, Philip H., Lewkebandara, T. Suren, Heeg, Mary Jane, Proscia, James W. (1992) A single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in the chemical vapor deposition process. Journal Of The American Chemical Society, 114 (3) 1095-1097 doi:10.1021/ja00029a053
Winter, Charles H., Lewkebandara, T. Suren, Proscia, James W., Rheingold, Arnold L. (1993) A class of single-source precursors to titanium disulfide films. Synthesis, structure, and chemical vapor deposition studies of [TiCl4(HSR)2]. Inorganic Chemistry, 32 (18) 3807-3808 doi:10.1021/ic00070a007
Winter, Charles H., Proscia, James W., Rheingold, Arnold L., Lewkebandara, T. Suren (1994) [TiCl4(NH3)2]: An Improved Single-Source Precursor to Titanium Nitride Films. Crystal and Molecular Structure of [TiCl4(TPPO)2] (TPPO = tripiperidinophosphine Oxide. Inorganic Chemistry, 33 (6) 1227-1229 doi:10.1021/ic00084a043
Lewkebandara, T. Suren, Winter, Charles H. (1994) CVD routes to titanium disulfide films. Advanced Materials, 6. 237-239 doi:10.1002/adma.19940060313
Scheper, Joseph T., Mesthrige, Kapila Wadu, Proscia, James W., Liu, Gang-Yu, Winter, Charles H. (1999) Atmospheric Pressure Chemical Vapor Deposition of Titanium Aluminum Nitride Films. Chemistry of Materials, 11. 3490-3496 doi:10.1021/cm990157u
Lewkebandara, T. Suren, Sheridan, Philip H., Heeg, Mary Jane, Rheingold, Arnold L., Winter, Charles H. (1994) Terminal and Bridging Imido Complexes from Titanium Tetrachloride and Primary Amines. Implications for the Chemical Vapor Deposition of Titanium Nitride Films. Inorganic Chemistry, 33 (25) 5879-5889 doi:10.1021/ic00103a041
McKarns, Peggy J., Lewkebandara, T. Suren, Yap, Glenn P. A., Liable-Sands, Louise M., Rheingold, Arnold L., Winter, Charles H. (1998) Adducts of Titanium Tetrachloride with Alkylselenium Compounds:  Molecular Precursors to Titanium Diselenide Films. Inorganic Chemistry, 37 (3) 418-424 doi:10.1021/ic970945q
Winter, Charles H., Lewkebandara, T. Suren, Shui, Xuiqi, Zhou, Xiao -Xing (1993) Difluoro(?5-bis-1,3-trimethylsilylcyclopentadienyl) (?5-trimethylsilylcyclopentadienyl)titanium(IV) Journal of Crystallographic and Spectroscopic Research, 23 (8) 685-687 doi:10.1007/bf01325195
Klesko, Joseph P., Kerrigan, Marissa M., Winter, Charles H. (2016) Low Temperature Thermal Atomic Layer Deposition of Cobalt Metal Films. Chemistry of Materials, 28. 700-703 doi:10.1021/acs.chemmater.5b03504
Kalutarage, Lakmal C., Clendenning, Scott B., Winter, Charles H. (2014) Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent. Chemistry of Materials, 26. 3731-3738 doi:10.1021/cm501109r
 
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