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(2004) Latest results regarding binary metal oxide semiconductor deposited by sputtering for gas sensing applications. Ceramics International, 30. 2049pp. doi:10.1016/s0272-8842(04)00071-9

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Reference TypeJournal (article/letter/editorial)
TitleLatest results regarding binary metal oxide semiconductor deposited by sputtering for gas sensing applications
JournalCeramics International
Year2004Volume30
PublisherElsevier BV
DOIdoi:10.1016/s0272-8842(04)00071-9Search in ResearchGate
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Mindat Ref. ID4199718Long-form Identifiermindat:1:5:4199718:3
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Full Reference(2004) Latest results regarding binary metal oxide semiconductor deposited by sputtering for gas sensing applications. Ceramics International, 30. 2049pp. doi:10.1016/s0272-8842(04)00071-9
Plain Text(2004) Latest results regarding binary metal oxide semiconductor deposited by sputtering for gas sensing applications. Ceramics International, 30. 2049pp. doi:10.1016/s0272-8842(04)00071-9
In(2004) Ceramics International Vol. 30. Elsevier BV

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