Hsu, PeiPei, Ip, Sikyin, Park, Chan, McNallan, Michael J. (1993) Oxidation of Silicon, Silicon Carbide, and Silicon Nitride in Gases Containing Oxygen and Chlorine. Journal of the American Ceramic Society, 76 (6). 1621-1623 doi:10.1111/j.1151-2916.1993.tb03952.x
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Oxidation of Silicon, Silicon Carbide, and Silicon Nitride in Gases Containing Oxygen and Chlorine | ||
| Journal | Journal of the American Ceramic Society | ||
| Authors | Hsu, PeiPei | Author | |
| Ip, Sikyin | Author | ||
| Park, Chan | Author | ||
| McNallan, Michael J. | Author | ||
| Year | 1993 (June) | Volume | 76 |
| Issue | 6 | ||
| Publisher | Wiley | ||
| DOI | doi:10.1111/j.1151-2916.1993.tb03952.xSearch in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4091309 | Long-form Identifier | mindat:1:5:4091309:6 |
| GUID | 0 | ||
| Full Reference | Hsu, PeiPei, Ip, Sikyin, Park, Chan, McNallan, Michael J. (1993) Oxidation of Silicon, Silicon Carbide, and Silicon Nitride in Gases Containing Oxygen and Chlorine. Journal of the American Ceramic Society, 76 (6). 1621-1623 doi:10.1111/j.1151-2916.1993.tb03952.x | ||
| Plain Text | Hsu, PeiPei, Ip, Sikyin, Park, Chan, McNallan, Michael J. (1993) Oxidation of Silicon, Silicon Carbide, and Silicon Nitride in Gases Containing Oxygen and Chlorine. Journal of the American Ceramic Society, 76 (6). 1621-1623 doi:10.1111/j.1151-2916.1993.tb03952.x | ||
| In | (1993, June) Journal of the American Ceramic Society Vol. 76 (6) Wiley | ||
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