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Li, Gaoren, Tong, Yexiang, Wang, Yu, Liu, Guankun (2003) Electrodeposition of Lu–Ni alloy thin films. Electrochimica Acta, 48 (27). 4061-4067 doi:10.1016/s0013-4686(03)00563-2

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Reference TypeJournal (article/letter/editorial)
TitleElectrodeposition of Lu–Ni alloy thin films
JournalElectrochimica Acta
AuthorsLi, GaorenAuthor
Tong, YexiangAuthor
Wang, YuAuthor
Liu, GuankunAuthor
Year2003 (November)Volume48
Issue27
PublisherElsevier BV
DOIdoi:10.1016/s0013-4686(03)00563-2Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID3188461Long-form Identifiermindat:1:5:3188461:3
GUID0
Full ReferenceLi, Gaoren, Tong, Yexiang, Wang, Yu, Liu, Guankun (2003) Electrodeposition of Lu–Ni alloy thin films. Electrochimica Acta, 48 (27). 4061-4067 doi:10.1016/s0013-4686(03)00563-2
Plain TextLi, Gaoren, Tong, Yexiang, Wang, Yu, Liu, Guankun (2003) Electrodeposition of Lu–Ni alloy thin films. Electrochimica Acta, 48 (27). 4061-4067 doi:10.1016/s0013-4686(03)00563-2
In(2003, November) Electrochimica Acta Vol. 48 (27) Elsevier BV

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