Ceresa, E.Mello, Garbassi, F. (1983) AES/XPS Thickness measurement of the native oxide on single crystal Si wafers. Materials Chemistry and Physics, 9. 371-385 doi:10.1016/0254-0584(83)90013-5
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | AES/XPS Thickness measurement of the native oxide on single crystal Si wafers | ||
| Journal | Materials Chemistry and Physics | ||
| Authors | Ceresa, E.Mello | Author | |
| Garbassi, F. | Author | ||
| Year | 1983 (October) | Volume | 9 |
| Publisher | Elsevier BV | ||
| DOI | doi:10.1016/0254-0584(83)90013-5Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 3048858 | Long-form Identifier | mindat:1:5:3048858:2 |
| GUID | 0 | ||
| Full Reference | Ceresa, E.Mello, Garbassi, F. (1983) AES/XPS Thickness measurement of the native oxide on single crystal Si wafers. Materials Chemistry and Physics, 9. 371-385 doi:10.1016/0254-0584(83)90013-5 | ||
| Plain Text | Ceresa, E.Mello, Garbassi, F. (1983) AES/XPS Thickness measurement of the native oxide on single crystal Si wafers. Materials Chemistry and Physics, 9. 371-385 doi:10.1016/0254-0584(83)90013-5 | ||
| In | (1983, October) Materials Chemistry and Physics Vol. 9 (4) Elsevier BV | ||
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