| Reference Type | Journal (article/letter/editorial) |
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| Title | Formation of TiN by nitridation of magnetron sputtered Ti films using microwave plasma CVD |
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| Journal | Journal of Crystal Growth |
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| Authors | Moon, Jong | Author |
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| Ito, Toshimichi | Author |
| Ma, Jing Sheng | Author |
| Hiraki, Akio | Author |
| Year | 1991 (December) | Volume | 115 |
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| Issue | 1 |
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| Publisher | Elsevier BV |
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| DOI | doi:10.1016/0022-0248(91)90809-jSearch in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 2804201 | Long-form Identifier | mindat:1:5:2804201:3 |
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|
| GUID | 0 |
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| Full Reference | Moon, Jong, Ito, Toshimichi, Ma, Jing Sheng, Hiraki, Akio (1991) Formation of TiN by nitridation of magnetron sputtered Ti films using microwave plasma CVD. Journal of Crystal Growth, 115 (1). 589-595 doi:10.1016/0022-0248(91)90809-j |
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| Plain Text | Moon, Jong, Ito, Toshimichi, Ma, Jing Sheng, Hiraki, Akio (1991) Formation of TiN by nitridation of magnetron sputtered Ti films using microwave plasma CVD. Journal of Crystal Growth, 115 (1). 589-595 doi:10.1016/0022-0248(91)90809-j |
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| In | (1991, December) Journal of Crystal Growth Vol. 115 (1) Elsevier BV |
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These are possibly similar items as determined by title/reference text matching only.