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Seino, Y., Nagai, S. (1993) Temperature dependence of the Young's modulus of diamond thin film prepared by microwave plasma chemical vapour deposition. Journal of Materials Science Letters, 12 (5) 324-325 doi:10.1007/bf01910092

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Reference TypeJournal (article/letter/editorial)
TitleTemperature dependence of the Young's modulus of diamond thin film prepared by microwave plasma chemical vapour deposition
JournalJournal of Materials Science Letters
AuthorsSeino, Y.Author
Nagai, S.Author
Year1993 (March)Volume12
Issue5
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/bf01910092Search in ResearchGate
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Mindat Ref. ID16413766Long-form Identifiermindat:1:5:16413766:0
GUID0
Full ReferenceSeino, Y., Nagai, S. (1993) Temperature dependence of the Young's modulus of diamond thin film prepared by microwave plasma chemical vapour deposition. Journal of Materials Science Letters, 12 (5) 324-325 doi:10.1007/bf01910092
Plain TextSeino, Y., Nagai, S. (1993) Temperature dependence of the Young's modulus of diamond thin film prepared by microwave plasma chemical vapour deposition. Journal of Materials Science Letters, 12 (5) 324-325 doi:10.1007/bf01910092
In(1993, March) Journal of Materials Science Letters Vol. 12 (5) Springer Science and Business Media LLC

See Also

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Seino, Y., Hida, N., Nagai, S. (1992) Mechanical properties of diamond thin films prepared by chemical vapour deposition. Journal of Materials Science Letters, 11 (8) 515-517 doi:10.1007/bf00731123
Ahn, Jaeshin, Tan, F. H., Tan, H. S. (1993) Diamond thin film growth by microwave plasma chemical vapour deposition and investigation by scanning tunnelling/force microscopy and scanning electron microscopy. Journal of Materials Science Letters, 12 (10) 775-778 doi:10.1007/bf00626719
Chandra, L., Clyne, T. W. (1993) Use of an ultrasonic resonance technique to measure the in-plane Young's modulus of thin diamond films deposited by a d.c. plasma jet. Journal of Materials Science Letters, 12 (3) 191-195 doi:10.1007/bf00819956
Maruyama, T., Ikuta, Y. (1993) Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate. Journal of Materials Science, 28. 5540-5542 doi:10.1007/bf00367827
Maruyama, T., Ikuta, Y. (1993) Vanadium dioxide thin films prepared by chemical vapour deposition from vanadium(III) acetylacetonate. Journal of Materials Science, 28. 5073-5078 doi:10.1007/bf00361182
Ho Je, Jung, Lee, G. Y. (1992) Microstructures of diamond films deposited on (100) silicon wafer by microwave plasma-enhanced chemical vapour deposition. Journal of Materials Science, 27. 6324-6330 doi:10.1007/bf00576280
Okubo, T., Ikari, S., Kusakabe, K., Morooka, S. (1992) High-resolution scanning electron microscopy study on the early stage of diamond synthesis by microwave-plasma chemical vapour deposition. Journal of Materials Science Letters, 11 (8) 460-463 doi:10.1007/bf00731103
Hirai, H., Yazaki, Y., Fukunaga, O. (1991) Independent control of microwave power and substrate temperature in chemical vapour deposition diamond synthesis. Journal of Materials Science Letters, 10 (6) 330-332 doi:10.1007/bf00719699
Takahashi, N., Koukitu, A., Seki, H. (1996) Preparation and characterization of Y-system superconducting thin films by mist microwave-plasma chemical vapour deposition. Journal of Materials Science, 31. 2897-2902 doi:10.1007/bf00355999
Maruyama, T., Tago, T. (1993) Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate. Journal of Materials Science, 28. 5345-5348 doi:10.1007/bf00570088
Lee, M.B., Han, I.K., Lee, Y.J., Lee, J.I., Kang, K.N., Lim, H. (1993) Deposition temperature dependence of electrical instability in an InP metal-insulator-semiconductor capacitor provided by plasma-enhanced chemical vapour deposited silicon nitride. Journal of Materials Science Letters, 12 (2) doi:10.1007/bf00241857
 
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