Hirao, Takashi, Kamada, Takeshi, Kitagawa, Masatoshi, Setsune, Kentaro, Wasa, Kiyotaka, Matsuda, Akihisa, Tanaka, Kazunobu (1988) Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method. Japanese Journal of Applied Physics, 27. 528-533 doi:10.1143/jjap.27.528
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method | ||
| Journal | Japanese Journal of Applied Physics | ||
| Authors | Hirao, Takashi | Author | |
| Kamada, Takeshi | Author | ||
| Kitagawa, Masatoshi | Author | ||
| Setsune, Kentaro | Author | ||
| Wasa, Kiyotaka | Author | ||
| Matsuda, Akihisa | Author | ||
| Tanaka, Kazunobu | Author | ||
| Year | 1988 (April 20) | Volume | 27 |
| Publisher | Japan Society of Applied Physics | ||
| DOI | doi:10.1143/jjap.27.528Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 14992007 | Long-form Identifier | mindat:1:5:14992007:2 |
| GUID | 0 | ||
| Full Reference | Hirao, Takashi, Kamada, Takeshi, Kitagawa, Masatoshi, Setsune, Kentaro, Wasa, Kiyotaka, Matsuda, Akihisa, Tanaka, Kazunobu (1988) Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method. Japanese Journal of Applied Physics, 27. 528-533 doi:10.1143/jjap.27.528 | ||
| Plain Text | Hirao, Takashi, Kamada, Takeshi, Kitagawa, Masatoshi, Setsune, Kentaro, Wasa, Kiyotaka, Matsuda, Akihisa, Tanaka, Kazunobu (1988) Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method. Japanese Journal of Applied Physics, 27. 528-533 doi:10.1143/jjap.27.528 | ||
| In | (1988) Japanese Journal of Applied Physics Vol. 27. Japan Society of Applied Physics | ||
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