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Torii, Yasuhiro, Yamada, Hiroshi (1982) Field-Emission Liquid Aluminum Ion Source. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l132

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Reference TypeJournal (article/letter/editorial)
TitleField-Emission Liquid Aluminum Ion Source
JournalJapanese Journal of Applied Physics
AuthorsTorii, YasuhiroAuthor
Yamada, HiroshiAuthor
Year1982 (March 5)Volume21
PublisherJapan Society of Applied Physics
DOIdoi:10.1143/jjap.21.l132Search in ResearchGate
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Mindat Ref. ID14985671Long-form Identifiermindat:1:5:14985671:5
GUID0
Full ReferenceTorii, Yasuhiro, Yamada, Hiroshi (1982) Field-Emission Liquid Aluminum Ion Source. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l132
Plain TextTorii, Yasuhiro, Yamada, Hiroshi (1982) Field-Emission Liquid Aluminum Ion Source. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l132
In(1982) Japanese Journal of Applied Physics Vol. 21. Japan Society of Applied Physics

See Also

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Torii, Yasuhiro, Yamada, Hiroshi (1983) An Aluminum Liquid Metal Ion Source with Prolonged Lifetime Using a Sintered Boride Emitter. Japanese Journal of Applied Physics, 22. doi:10.1143/jjap.22.l444
Ishitani, Tohru, Shimase, Akira, Tamura, Hifumi (1982) Carbon Needle Emitter for Boron and Aluminum Ion Liquid-Metal-Ion Sources. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l277
Daimon, Hiroshi, Murata, Yoshitada (1982) Ion Oxidation of Si(111) Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l718
Horiike, Yasuhiro, Yamazaki, Takashi, Shibagaki, Masahiro, Kurisaki, Tetsuo (1982) Aluminum Reactive Ion Etching Employing CCl4+Cl2Mixture. Japanese Journal of Applied Physics, 21. 1412-1420 doi:10.1143/jjap.21.1412
Ishitani, Tohru, Koike, Hidemi, Sakudo, Noriyuki (1982) Extracted-Beam Divergence Calculations for a Liquid-Metal Ion Source. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l155
Nakazawa, Kenji, Yamada, Hiroshi, Kohda, Shigeto, Torii, Yasuhiro (1988) A Thin-Film Transistor Using a Reactive-Ion-Beam-Deposited Polycrystalline Silicon Film. Japanese Journal of Applied Physics, 27. 1002-1004 doi:10.1143/jjap.27.1002
Saiki, Koichiro, Tanaka, Shoji (1982) Ion-Induced Auger Electron Emission from Si Surface. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l529
Matsuo, Seitaro, Adachi, Yoshio (1982) Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l4
Nozawa, Hiroshi, Kohyama, Susumu (1982) A Thermionic Electron Emission Model for Charge Retention in SAMOS Structure. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l111
Todokoro, Hideo, Saitou, Norio, Yamamoto, Shigehiko (1982) Role of Ion Bombardment in Field Emission Current Instability. Japanese Journal of Applied Physics, 21. 1513-1516 doi:10.1143/jjap.21.1513
Matsukawa, Yoshinobu, Nakagawa, Yoshiro (1982) Conical Pinched Electron Beam Diode for Intense Ion Beam Source. Japanese Journal of Applied Physics, 21. doi:10.1143/jjap.21.l657
 
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