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Rajeswari, R., Venugopal, D., Jayabal, P., Dhayal Raj, A. (2020) Fabrication and Characterization of TiO2 Thin Films and n-TiO2/p-Si Junction Diodes via Dip Coating Technique. Acta Physica Polonica A, 138 (3) 539-545 doi:10.12693/aphyspola.138.539

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Reference TypeJournal (article/letter/editorial)
TitleFabrication and Characterization of TiO2 Thin Films and n-TiO2/p-Si Junction Diodes via Dip Coating Technique
JournalActa Physica Polonica A
AuthorsRajeswari, R.Author
Venugopal, D.Author
Jayabal, P.Author
Dhayal Raj, A.Author
Year2020 (September)Volume138
Issue3
PublisherInstitute of Physics, Polish Academy of Sciences
DOIdoi:10.12693/aphyspola.138.539Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID13831749Long-form Identifiermindat:1:5:13831749:4
GUID0
Full ReferenceRajeswari, R., Venugopal, D., Jayabal, P., Dhayal Raj, A. (2020) Fabrication and Characterization of TiO2 Thin Films and n-TiO2/p-Si Junction Diodes via Dip Coating Technique. Acta Physica Polonica A, 138 (3) 539-545 doi:10.12693/aphyspola.138.539
Plain TextRajeswari, R., Venugopal, D., Jayabal, P., Dhayal Raj, A. (2020) Fabrication and Characterization of TiO2 Thin Films and n-TiO2/p-Si Junction Diodes via Dip Coating Technique. Acta Physica Polonica A, 138 (3) 539-545 doi:10.12693/aphyspola.138.539
In(2020, September) Acta Physica Polonica A Vol. 138 (3) Institute of Physics, Polish Academy of Sciences

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