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Li, Aolin, Pan, Jiangling, Yang, Zhixiong, Zhou, Lin, Xiong, Xiang, Ouyang, Fangping (2018) Charge and strain induced magnetism in monolayer MoS2 with S vacancy. Journal of Magnetism and Magnetic Materials, 451. 520-525 doi:10.1016/j.jmmm.2017.11.074

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Reference TypeJournal (article/letter/editorial)
TitleCharge and strain induced magnetism in monolayer MoS2 with S vacancy
JournalJournal of Magnetism and Magnetic Materials
AuthorsLi, AolinAuthor
Pan, JianglingAuthor
Yang, ZhixiongAuthor
Zhou, LinAuthor
Xiong, XiangAuthor
Ouyang, FangpingAuthor
Year2018 (April)Volume451
PublisherElsevier BV
DOIdoi:10.1016/j.jmmm.2017.11.074Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID12166013Long-form Identifiermindat:1:5:12166013:2
GUID0
Full ReferenceLi, Aolin, Pan, Jiangling, Yang, Zhixiong, Zhou, Lin, Xiong, Xiang, Ouyang, Fangping (2018) Charge and strain induced magnetism in monolayer MoS2 with S vacancy. Journal of Magnetism and Magnetic Materials, 451. 520-525 doi:10.1016/j.jmmm.2017.11.074
Plain TextLi, Aolin, Pan, Jiangling, Yang, Zhixiong, Zhou, Lin, Xiong, Xiang, Ouyang, Fangping (2018) Charge and strain induced magnetism in monolayer MoS2 with S vacancy. Journal of Magnetism and Magnetic Materials, 451. 520-525 doi:10.1016/j.jmmm.2017.11.074
In(n.d.) Journal of Magnetism and Magnetic Materials Vol. 451. Elsevier BV

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