| Reference Type | Journal (article/letter/editorial) |
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| Title | Performance of Vertically Aligned MWCNTs/Ni/Ti/Au/Si Electrode for Supercapacitors by CVD |
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| Journal | Advanced Materials Research |
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| Authors | Hsieh, Tung Feng | Author |
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| You, Mei Li | Author |
| Year | 2013 (September) | Volume | 813 |
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| Publisher | Trans Tech Publications, Ltd. |
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| DOI | doi:10.4028/www.scientific.net/amr.813.336Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 11724081 | Long-form Identifier | mindat:1:5:11724081:2 |
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| GUID | 0 |
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| Full Reference | Hsieh, Tung Feng, You, Mei Li (2013) Performance of Vertically Aligned MWCNTs/Ni/Ti/Au/Si Electrode for Supercapacitors by CVD. Advanced Materials Research, 813. 336-339 doi:10.4028/www.scientific.net/amr.813.336 |
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| Plain Text | Hsieh, Tung Feng, You, Mei Li (2013) Performance of Vertically Aligned MWCNTs/Ni/Ti/Au/Si Electrode for Supercapacitors by CVD. Advanced Materials Research, 813. 336-339 doi:10.4028/www.scientific.net/amr.813.336 |
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| In | (n.d.) Advanced Materials Research Vol. 813. Trans Tech Publications, Ltd. |
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