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Chen, Shuang, Dong, Cui Zhi, Zhang, Li Fang, Yu, Zhi Ming (2012) Annealing Effects on W-Doped VO2 Thin Films Prepared from Magnetron Sputtering. Advanced Materials Research, 538. 101-104 doi:10.4028/www.scientific.net/amr.538-541.101

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Reference TypeJournal (article/letter/editorial)
TitleAnnealing Effects on W-Doped VO2 Thin Films Prepared from Magnetron Sputtering
JournalAdvanced Materials Research
AuthorsChen, ShuangAuthor
Dong, Cui ZhiAuthor
Zhang, Li FangAuthor
Yu, Zhi MingAuthor
Year2012 (June)Volume538
PublisherTrans Tech Publications, Ltd.
DOIdoi:10.4028/www.scientific.net/amr.538-541.101Search in ResearchGate
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Mindat Ref. ID11686348Long-form Identifiermindat:1:5:11686348:7
GUID0
Full ReferenceChen, Shuang, Dong, Cui Zhi, Zhang, Li Fang, Yu, Zhi Ming (2012) Annealing Effects on W-Doped VO2 Thin Films Prepared from Magnetron Sputtering. Advanced Materials Research, 538. 101-104 doi:10.4028/www.scientific.net/amr.538-541.101
Plain TextChen, Shuang, Dong, Cui Zhi, Zhang, Li Fang, Yu, Zhi Ming (2012) Annealing Effects on W-Doped VO2 Thin Films Prepared from Magnetron Sputtering. Advanced Materials Research, 538. 101-104 doi:10.4028/www.scientific.net/amr.538-541.101
In(n.d.) Advanced Materials Research Vol. 538. Trans Tech Publications, Ltd.

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