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Jang, Eujean, Kwun, Gijin, Choi, Wansik, Lee, Haiwon (2008) Atomic force microscope anodization lithography using a triarylsulfonium salt photoinitiator. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 313. 383-386 doi:10.1016/j.colsurfa.2007.05.086

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Reference TypeJournal (article/letter/editorial)
TitleAtomic force microscope anodization lithography using a triarylsulfonium salt photoinitiator
JournalColloids and Surfaces A: Physicochemical and Engineering Aspects
AuthorsJang, EujeanAuthor
Kwun, GijinAuthor
Choi, WansikAuthor
Lee, HaiwonAuthor
Year2008 (February)Volume313
PublisherElsevier BV
DOIdoi:10.1016/j.colsurfa.2007.05.086Search in ResearchGate
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Mindat Ref. ID11037420Long-form Identifiermindat:1:5:11037420:0
GUID0
Full ReferenceJang, Eujean, Kwun, Gijin, Choi, Wansik, Lee, Haiwon (2008) Atomic force microscope anodization lithography using a triarylsulfonium salt photoinitiator. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 313. 383-386 doi:10.1016/j.colsurfa.2007.05.086
Plain TextJang, Eujean, Kwun, Gijin, Choi, Wansik, Lee, Haiwon (2008) Atomic force microscope anodization lithography using a triarylsulfonium salt photoinitiator. Colloids and Surfaces A: Physicochemical and Engineering Aspects, 313. 383-386 doi:10.1016/j.colsurfa.2007.05.086
In(n.d.) Colloids and Surfaces A: Physicochemical and Engineering Aspects Vol. 313. Elsevier BV

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