(1961) Annealing of residual stress in silicon monoxide films. British Journal of Applied Physics, 12 (10) 581 doi:10.1088/0508-3443/12/10/128
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Annealing of residual stress in silicon monoxide films | ||
| Journal | British Journal of Applied Physics | ||
| Year | 1961 (October) | Volume | 12 |
| Issue | 10 | ||
| Publisher | IOP Publishing | ||
| DOI | doi:10.1088/0508-3443/12/10/128Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 10691032 | Long-form Identifier | mindat:1:5:10691032:0 |
| GUID | 0 | ||
| Full Reference | (1961) Annealing of residual stress in silicon monoxide films. British Journal of Applied Physics, 12 (10) 581 doi:10.1088/0508-3443/12/10/128 | ||
| Plain Text | (1961) Annealing of residual stress in silicon monoxide films. British Journal of Applied Physics, 12 (10) 581 doi:10.1088/0508-3443/12/10/128 | ||
| In | (1961, October) British Journal of Applied Physics Vol. 12 (10) IOP Publishing | ||
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