| Reference Type | Journal (article/letter/editorial) |
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| Title | Nano-phase separation of arsenic tri-sulphide (As2S3) film and its effect on plasma etching |
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| Journal | Journal of Non-Crystalline Solids |
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| Authors | Choi, D.-Y. | Author |
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| Madden, S. | Author |
| Wang, R.P. | Author |
| Rode, A. | Author |
| Krolikowska, M. | Author |
| Luther-Davies, B. | Author |
| Year | 2007 (April) | Volume | 353 |
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| Issue | 8 |
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| Publisher | Elsevier BV |
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| DOI | doi:10.1016/j.jnoncrysol.2006.12.102Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 645461 | Long-form Identifier | mindat:1:5:645461:0 |
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| GUID | 0 |
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| Full Reference | Choi, D.-Y., Madden, S., Wang, R.P., Rode, A., Krolikowska, M., Luther-Davies, B. (2007) Nano-phase separation of arsenic tri-sulphide (As2S3) film and its effect on plasma etching. Journal of Non-Crystalline Solids, 353 (8) 953-955 doi:10.1016/j.jnoncrysol.2006.12.102 |
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| Plain Text | Choi, D.-Y., Madden, S., Wang, R.P., Rode, A., Krolikowska, M., Luther-Davies, B. (2007) Nano-phase separation of arsenic tri-sulphide (As2S3) film and its effect on plasma etching. Journal of Non-Crystalline Solids, 353 (8) 953-955 doi:10.1016/j.jnoncrysol.2006.12.102 |
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| In | (2007, April) Journal of Non-Crystalline Solids Vol. 353 (8) Elsevier BV |
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